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13.56 MHz – generator
To compliance DIN EN 55011, all our 13.56 MHz are quartz-stabilized. The impedance matching is fixed, manual or automatic possible.Main applications are activating, cleaning, etching, semi-conductor (front-end), semi-conductor (back-end) and plasmapolymerization.
40 kHz – generator
The impedance matching is only automatic possible. The power is in two different sizes possible. Main applications are activation, cleaning, etching, semi-conductor (back-end), plasma polymerization.
2.45 GHz – generator (Micro waven)
The power is 0-300 Watt, the generator has pc connection. Main applications are activation, cleaning, etching, semi-conductor (front-end), semi-conductor (back-end), plasma polymerization.
2/2 way valve for liquid dosage
Valve for selective dose of monomers.
You find a detailed description of our different control variants on plasma systems/controls/semi automatic under the menu controls.
Fully automatic control
You find a detailed description of our different control variants on plasma systems/controls/fully automatic under the menu controls.
You find a detailed description of our different control variants on plasma systems/controls/pc control under the menu controls.
Based on Windows CE with touch panel. You find a detailed description of our different control variants on plasma systems/controls/pcce control under the menu controls.
Active Carbon filter
Active carbon can be changed easily.
Suction filter for vacuum
The chamber can be heated up to 80°C. The temperature is adjustable. For defined process conditions and higher etching rates.
Bias voltage measurement
The bias voltage measurement is a measurement device and is available for kHz and MHz generators.
Is a plasma polymerization equipment. For the connection of liquid monomers to the process vacuum chamber. Instead of the normal monomer bottle the bubbler bottle works with a carrier gas. The carrier gas f.e. argon will be flushed thorugh the monomer.
Documentation in national language
Documentation according to the machine rules 89/392/EWG. Does not apply for german and english language. This option has to be ordered, otherwise a documentation isn’t attached.
f.e. treatment of bulk materials.
Pirani sensor or Baratron – pressure indication it the vacuum chamber.
Continous flow installation
Spare parts set standard or PFPE
The spare parts set standard and PFPE includes 1 pc. locking collar, 1 pc. seal, 1 pc. stainless steel corrugated tube (vacuum tube), 1 pc. window glass, 1 pc. door seal, 10 pcs. of micro fuses, and in the standard parts set 1 liter mineral oil for vacuum pump and for the PFPE set 1 liter PFPE- oil for the vacuum pump.
Gas bottle holder
Fastening to shelves or wall last at the work-table. The span width is 70 mm. The lashing strap safeguards without room to move. He is suitable for all bottle sizes.
Gas warning system (Dräger)
The parts that need to be treated are placed on the heating plate. The plate can be heated up to max. 150°C. For defined process conditions and higher etching rates.
Fit out with temperature indicator, a tempreature sensor will be installed inside the vacuum chamber. The surface temperature can be measured during the process.
Temperature indicator integrated in the PC control, a temperature sensor will be installed inside the vacuum chamber. The surface temperature can be measured during the process. The value of the temperature will be shown on the pc monitor.
Ion current sensor
Custom designed tracks
Our plasma systems will be delivered with one tray for standard. Further trays or other constructions can be produced ater consulting Diener electronic.
Lacquer spray / glass sheets set (LABS-free test)
Equipment for processing LABS-test: Set includes: Lacquer spray in tins, 5 pieces each 400 ml, glass sheets, 100 pieces, each 90 mm x 110 mm.
Longer vacuum chamber (Femto, Pico, Nano, …)
Our systems have been measured (window pane) concerning irradiation according to DIN 12198. Result: inoxious. Vaccum chambers are available in stainless steel, borosilicate glass and quartz glass. The chamber cover, cap or hinged door, can be chosen. The length of the vacuum chamber depends on what a plasma cleaner you need. Please talk to us.
The display shows the power of the generator. It’s a analog display.
Can be delivered round or rectangular. More parts can be treated per process. Please consult Diener electronic regarding the exactly construction of your individual electrode as well as other materials for the manufacturing of your trays.
Microwave leak tester
Plasma poymerization equipment. For connection of liquid monomers to the process/vacuum chamber.
OES – optical emission spectrometer
Conrolling of plasma process for quality assurance. End point detection of plasma process. OES only together with a PC controlled system.
Process gas bottle
Oxygen-bottle as process gas in 2, 5 and 10 litres available. Hydrogen-bottle as process gas in 2 litres and Argon-bottle as process gas in 5 litres available. For delivery of gas-bottles please note that there are special transport conditions. If you want to rent a system you must buy the bottle.
Quarz glass boat
Available in two different dimensions. For ultra pure plasma processes and wafer treatment.
Available in round and rectangular, for upper etching rates. Application areas are anisotropic and isotropic etching.
RIE-electrode with gas shower
Rectangular of stainless steel, upper etching rates because of a homogeneous gas distribution. Application area is anisotropic etching.
Role to role system
E.g. for treatment of foil / Lead-frames
Safety valve for operations with Wasserstoff, Ethin …
Special electrodes and trays
Our systems will be delivered with one tray for standard. Further trays or other constructions can be produced alfter consulting Diener electronic.
Special flange / additional flange
Special vacuum chamber
Our systems have been measured (window pane) concerning irradiation according to DIN 12198. Result: inoxious. Special vacuum chambers are available round with cap, rectangular with hinged door, they are from aluminium and are different in inner diameter and opening diameter of recipient.
Standard-electrode round or rectangular
Of stainless steel/aluminium for standard plasma processes.
Temperature indicator for chamber temperature without heating plate. A temperature indicator will be installed inside the vacuum chamber. The surface temperature can be measured during the process. The temperature indicator is also available integraded in the PC control. The value of the temperature will be shown on the pc monitor.
For substances with low vapor pressure. Cup diameter: 16 mm, cup volume: 0,1 l. Screening against plasma effect, control of temperature (max. 500°C) and temperature rise rate (up to 250°C/min). Connection with small flange feedthrough.
For setting up the process time. Manufacturer: NAIS, type LT4H.
Vacuum chamber of glas (borosilicate or quartz)
Vacuum chamber of borosilicate glass are for pure plasma processes, vacuum chambers of quartz glass are for ultra pure plasma processes.
Vacuum chambers of stainless steel
Vacuum chambers of stainless steel are for standard plasma processes.
Rotary vane pumps or dry pumps with mineral or PFPE oil. Our pumps are available with mineral oil and PFPE oil also. The pumps will be delivered oil-filledly.
Device for powder treatment
Powder will be treated in a rotating glass bottle. For filling it is possible to take out the bottle of the chamber.
For the preliminary purification of small parts in the washing machine. Diameter: 550 mm x 300 mm, minimum order quantity: 20 pieces.
Washing machine / Dryer
For the preliminary purification of small parts before plasma treatment. Only neccessary for strong contaminated parts. Manufacturer Miele, Type: WT 2670 WPM.
Water cooling system
Because of the two chamge machine contacts for pump protection circuit the connection is free of potential.
Water cooled tray plate
Water cooled tray plate will be installed on the bottom of the chamber. Including water pump and water tank. For cooling down of heat sensitive parts.
Additional Software options
The software can be modified with further options every time. Please specify your claims.
Additional gas supply
Needle valve: Our systems are available with any needle valves or Mass-Flow-Controllers (MFCs). Standard of plasma system type Femto are 1-3 pieces, more on request.
MFCs: Needed for PC and PCCE control. Our plasma systems are available with any Mass-Flow-ConroUnsere Anlagen können mit beliebig vielen Mass-Flow-Controllern (MFCs) ausgestattet werden.
Most of these options / accessories can also be introduced after production.